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The CEPLANT Research Infrastructure offers open access to its experimental facilities for external users. Access to laboratories and equipment is provided free of charge for both national and international academic users, on the condition that the results of the experiments are made publicly available. The costs associated with access are covered by the Large Research Infrastructures program, funded by the Ministry of Education, Youth and Sports of the Czech Republic.

Research topics

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Fundamental research

Discharges, Plasma, and Process Diagnostics & Modelling

We investigate a wide range of various discharges and plasmas – from nanosecond transient discharges to deposition processes and plasma interactions with condensed matter – using state-of-the-art electrical, optical, and laser spectroscopy diagnostics. These high-sensitivity and high-resolution techniques enable detailed insight into plasma behavior and dynamics. To complement experimental observations, we develop analytical models and perform computer simulations that are essential for understanding gas discharge physics and the mechanisms behind observed plasma phenomena.

 

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Applied research

Plasma Technologies and Advanced Coatings

We focus on the development, innovation, and customization of atmospheric plasma sources for advanced material processing. These technologies enable precise and environmentally friendly surface modifications across a wide range of substrates. We specialize in the deposition of high-quality functional and hard coatings, as well as nanomaterials, using techniques such as Physical Vapor Deposition (PVD), Chemical Vapor Deposition (CVD), and other preparation techniques. By integrating plasma-assisted processes with conventional and emerging deposition techniques, we support applications in electronics, optics, biomedicine, and energy. Our work bridges fundamental plasma physics with industrial needs, offering tailored solutions for performance, durability, and sustainability.

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Analytics

We offer a broad portfolio of advanced analytical techniques for characterizing materials at the chemical, structural, and surface levels. Using our in-house instrumentation, we perform ultra-sensitive measurements of surface chemistry, morphology and structure through methods such as X-ray Photoelectron Spectroscopy (XPS), Raman Spectroscopy, Scanning electron microscopy (SEM), Energy-dispersive X-ray spectroscopy, Confocal Microscopy, Atomic Force Microscopy (AFM), Profilometry, Time-of-Flight Secondary Ion Mass Spectrometry (TOF-SIMS), MALDI Imaging, and X-ray diffractometry. Our capabilities include the evaluation of mechanical and optical properties using techniques such as Nanoindentation, Scratch and Tear Testing, Ellipsometry, and Spectrophotometry. These methods enable comprehensive insights into material behavior and performance, supporting both fundamental research and industrial applications with a focus on precision, reliability, and interdisciplinary integration.

Explore our research outputs

2025

2024

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Our equipment
Atmospheric plasma sources

  • Diffuse Coplanar Surface Barrier Discharge

    DCSBD

    DCSBD technology creates a thin layer of macroscopically uniform, high-density atmospheric plasma. Successful tests and industrial applications prove the unique properties of DCSBD plasma technology, which clearly distinguish it from other plasma technologies.

    DCSBD features:

    • atmospheric plasma, no vacuum systems needed
    • ignites in ambient air, but can also be generated in any reactive gas mixture (including hydrogen)
    • DCSBD unit is mechanically robust and the generated plasma is safe
    • cold plasma is gentle on heat-sensitive materials
    • meets the requirements of a fast in-line production in the textile and paper industry as well as roll-to-roll
    • scalable (from laboratory to large-scale applications)
    • optically homogeneous plasma
    • the thin diffusion layer of DCSBD plasma reaches a power density of 100 W/cm3

    Applications:

    • activation and cleaning of surfaces (glass, paper, wood, natural materials, metals, semiconductors, polymers – PS, PES, PET, PP, PTFE, PPTA, ...)
    • applicable to planar, curved and 3D surfaces (fabrics, fibers, medical catheters, seeds and grains, powders, ...)
    • surface wetting treatment
    • decontamination, sterilization
    • thin films – plasma-assisted deposition of thin films and plasma functionalization of coatings
    • generation of ozone and active particles
    • plasma etching of polymers, selective etching of composite materials
    • plasma-initiated rapid reduction of graphene oxide
    • applicable in a plethora of industries, from textiles, paper, glass and food to agricultural and medical applications

    DCSBD – CEPLANT

  • Plasma system with 25 DCSBD units

    Developed at the Department of Plasma Physics and Technology, the plasma system called Avatar is used for large-scale roll-to-roll applications. It is based on DCSBD technology and is a pilot line for surface treatment of nonwoven textiles. This plasma system contains 25 DCSBD plasma units operating at atmospheric pressure in the air. The system is fully automatic and capable of continuous industrial operation.

    Person of interest: doc. Mgr. Dušan Kováčik, PhD. dusan.kovacik(at)mail.muni.cz

  • Plasma system with curved electrode

    Developed at the Department of Plasma Physics and Technology, the plasma system with curved electrodes uses DCSBD plasma technology for large-scale roll-to-roll applications. This system is equipped with two DCSBD plasma units for double-sided treatment in ambient air. Both DCSBD units have a curved geometry for use in roll-to-roll applications. This equipment has been developed for large-area plasma pretreatment of flexible materials such as PET, PEN, and paper. The system can also be used for plasma production of nanostructured functional coatings in flexible and printed electronics.

    Person of interest: doc. Mgr. Dušan Kováčik, PhD. dusan.kovacik(at)mail.muni.cz

  • Equipment for the continuous treatment of flexible substrates by atmospheric pressure plasma generated in various gaseous atmospheres

    This device, developed at the Department of Plasma Physics and Technology, is suitable for the continuous treatment of flexible substrates by plasma generated at atmospheric pressure in various working gases. It is designed to treat thin and flexible samples up to 200 mm in width by plasma generated by diffusion coplanar surface barrier discharge. The closed reactor chamber allows the generation of low-temperature non-isothermal plasmas in all types of common industrial gases. The system is equipped with two concave curved DSCBD plasma units with automatic control of power and rewind speed of flexible films.

    The unique design of the working gas supply for the plasma generation also allows working in pure hydrogen or mixtures thereof. The sample unwinding speed is adjustable from 0.27 to 32 cm/s. This corresponds to a plasma treatment time of 0.3 - 30 s when using one electrode or max. 60 s for two electrodes. This device was developed through the project TAČR TJ01000327 and company ROPLASS s.r.o.

    Person of interest: RNDr. Richard Krumpolec, PhD. krumpolec(at)mail.muni.cz

  • Minor plasma system for flexible material processing

    This device, developed at the Department of Plasma Physics and Technology, utilizes a smaller plasma system with a curved DCSBD unit to treat a variety of flexible surfaces. The system can be used for flexible samples ranging in size from a few cm2 to A4. The concave curved DCSBD unit is placed in close proximity to the treated surface, which can be mounted on a 296 mm diameter dielectric cylinder with a curvature of 1/14.8 cm-1.

    This system can prepare materials for various applications such as photovoltaics, light emitting devices, and/or sensing systems on lightweight and low-cost substrates.

    Person of interest: Mgr. Slavomír Sihelník sihelnik(at)mail.muni.cz

  • Air pillow

    The DCSBD plasma technology unit called Air Pillow is a unique plasma device for the treatment of glass surfaces that was developed at the Department of Plasma Physics and Technology. This plasma system is capable of manual and inline treatment of large glass surfaces. An air bearings system controls the distance between the DCSBD plasma source and the glass surface.

    Person of interest: Mgr. Slavomír Sihelník sihelnik(at)mail.muni.cz

  • Plasma system for the treatment of planar materials

    The plasma system for the treatment of non-flexible materials was developed at the Department of Plasma Physics and Technology and uses DCSBD technology. The equipment can treat samples up to A4 size for various applications related to the functionalization of polymer, glass and metal surfaces. This system is also capable of processing wood and non-woven textiles.

    Person of interest: Mgr. Jakub Kelar, Ph.D. jakub.kelar(at)mail.muni.cz

  • Commercially available plasma sources

    Smaller commercially available devices

    • industrial corona suitable for material treatment in roll-to-roll applications – Person of interest: doc. Mgr. Dušan Kováčik, PhD. dusan.kovacik(at)mail.muni.cz
    • solution for planar and 3D objects – Person of interest: doc. Mgr. Dušan Kováčik, PhD. dusan.kovacik(at)mail.muni.cz
    • plasma multijet – Person of interest: doc. Mgr. Pavel Slavíček, Ph.D. ps94(at)physics.muni.cz
    • plasma pencil – Person of interest: doc. Mgr. Pavel Slavíček, Ph.D. ps94(at)physics.muni.cz
    • plazma jet with slit nozzle
    • ULD 60 Plasma Curtain from ACXYS Plasma Technologies – Person of interest: Mgr. Jakub Kelar, Ph.D. jakub.kelar(at)mail.muni.cz

  • Small plasmas systems based on multihollow MSDBD

    They extend the capabilities of conventional DCSBD plasma technology, which is limited to plasma generation at a very small distance from the dielectric barrier surface. The possibility of blowing through the dielectric barrier of the MSDBD plasma unit with working gas increases the effective distance for material treatment up to several millimeters (compared to the effective distance of DCSBD plasma of 0.3 mm). MSDBD plasma can be generated in various working gases (air, N2, O2, CO2, H2) and in mixtures of working gas with water vapor or pure water vapor.

    The technology is suitable for generating ozone, plasma-activated water vapor, and active particles for material surface treatment and thin film modification.

    Person of interest: RNDr. Richard Krumpolec, PhD. krumpolec(at)mail.muni.cz

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Plasma diagnostics

  • Pulsed picosecond laser

    The Ekspla pulsed picosecond laser system has a tunable wavelength range of 193 - 2300 nm. The system includes the PL2231-50-TRAIN Nd:YAG pulsed laser with the H400-APL2100-TRAIN amplification unit and harmonic generators and the PG411-SH-DUV optical parametric amplifier. The system produces 30 ps pulses at a frequency of 50 Hz. The energy of each pulse reaches tens of µJ in the UV region, hundreds of mJ for visible and IR radiation and 30 µJ for the 1064 nm primary beam.

    Applications:

    • detection of reactive particles in plasma using LIF and TALIF
    • mapping of time and space propagation of absolute concentration of reactive particles
    • measurement of local electric field in plasma using Electric field-induced second harmonic generation (EFISH) method

    Person of interest: doc. Mgr. Pavel Dvořák, Ph.D. pdvorak(at)physics.muni.cz

  • Pulsed nanosecond laser

    The laser system produces short pulses (10 ns) with wavelengths in the range of 204 - 1500 nm with a repetition rate of 30 Hz. It consists of a Quanta-Ray PRO-270-30 pulsed Nd:YAG pump laser, a Sirah PrecisionScan PRSC-D-24-EG dye laser and a higher harmonic frequency generator. The system is capable of operating with discharges at atmospheric pressure and in other reactive atmospheres.

    Applications:

    • detection of reactive particles in plasma using LIF and TALIF
    • mapping of time and space propagation of absolute concentration of reactive particles
    • measurement of radicals and metastables concentration (e.g. H, N, O, OH, Sn, Pb)
    • study of the mean life expectancy of active particles

    Person of interest: doc. Mgr. Pavel Dvořák, Ph.D. pdvorak(at)physics.muni.cz

  • Reactor for low-pressure capacitively coupled discharge

    The device, called Temelín, was manufactured at the Department of Plasma Physics and Technology. It is a low-pressure reactor for capacitively coupled discharges. Temelín has many diagnostic components: a Langmuir probe, a mass spectrometer with an energy analyzer, an optical emission spectrometer, and oscillators for measuring higher harmonic frequencies. The operating pressure of the chamber is from 0.1 Pa to 1 kPa.

    Applications:

    • study of plasma processes
    • monitoring of thin film etching
    • measurement of concentration of reactive particles (radicals, metastables)
    • study of non-linear electric plasma characteristics

    Person of interest: doc. Mgr. Pavel Dvořák, Ph.D. pdvorak(at)physics.muni.cz

  • Optical spectrometers

    The optical spectrometer is used to determine the composition of plasmas, to determine vibrational/rotational temperatures, or to measure particle concentrations. The Department of Plasma Physics and Technology has two large and three smaller portable spectrometers.

    • The Shamrock 750 from English manufacturer Andor is in a Czerny-Turner configuration with a focal length of 750 mm. The spectral range is 200 to 1000 nm. The device has three gratings (600, 1200, and 2400 apertures/mm). The spectral resolution is 0.04 nm*w/10 µm slit.
    • The FHR1000 from Horiba is also available in a Czerny-Turner configuration with a focal length of 1000 mm. The spectral range is 200 to 750 nm. The device has two gratings (2400 and 3600 apertures/mm). The spectral resolution is 0.01 nm*w/10 µm slit.
    • The AvaSpec-ULS-TEC portable spectrometers from Dutch company Avantes are suitable for fast and accurate radiation analysis over a wide range:
      • spectral range 200 - 1000 nm, slit width: 25 µm, grating: 300 vrypů/mm
      • spectral range 290 - 395 nm, slit width: 10 µm, grating: 2400 vrypů/mm
      • spectral range 740 - 924 nm, slit width: 25 µm, grating: 1200 vrypů/mm

    Person of interest: doc. Mgr. Pavel Slavíček, Ph.D. ps94(at)physics.muni.cz

  • ICCD cameras

    The Department of Plasma Physics and Technology has three ICCD cameras: PIMAX 2, 3, 4 from Princeton Instruments. They can capture very fast (up to 500 ps) and weak (low intensity) events. Princeton Instruments.

    Applications:

    • study of plasma elementary processes
    • study of instabilites of deposition plasmas
    • measurement of LIF a TALIF

    Person of interest: doc. Mgr. Pavel Dvořák, Ph.D. pdvorak(at)physics.muni.cz

  • Time-correlated photon counting

    The Simple-Tau 152 from Becker&Hickl is capable of time-correlated single photon counting (TCSPC) in two independent paths. This technology enables the recording of very weak optical signals with a high sampling rate of up to 7 ps and a resolution of up to 60 ps. The correlation time is in the range of 50 ns to 5 µs. The device is equipped with three fast PMC-100 photomultiplier tubes sensitive in the region from 185 nm to 820 nm.

    Applications:

    • plasma diagnostics and study of atmospheric discharges in gases
    • study of RF discharge ignition
    • measurement of electric field development

    Person of interest: doc. Mgr. Zdeněk Navrátil, Ph.D. zdenek(at)mail.muni.cz

  • Photomultipliers, electrical probes and oscilloscopes

    The Department of Plasma Physics and Technology also has smaller devices for plasma and discharge diagnostics. Among the photodetectors used is the PMT210 photomultiplier from Photek with parameters - rise time 90 ps and FWHM 135 ps. It can be used for time-resolved optical emission and laser spectroscopy. The department has commercial and self-assembled electrical probes with time resolution up to hundreds of ps with high sensitivity. Among the equipment are modern oscilloscopes with high bandwidth, high sampling rate, and wide dynamic range. They allow the processing and analysis of large amounts of data. Among our oscilloscopes is the DSO-S204A from Keysight Technologies with a bandwidth up to 6 GHz.

    Person of interest:  Mgr. Martina Mrkvičková, Ph.D. mrkm(at)mail.muni.cz

  • Software

    The Plasma Diagnostics and Modelling DPPT research group developed several software programs suitable for the analysis of diagnostic measurements:

    • MassiveOES for molecular spectra analysis
    • Spectrum Analyzer for atomic spectra analysis
    • EBFFit for measurement of the concentration of metal's ground states using self-absorption

    Person of interest: doc. Mgr. Zdeněk Navrátil, Ph.D. zdenek(at)mail.muni.cz

  • Quartz Crystal Microbalance

    Quartz Crystal Microbalance (QCM) from English company Kurt J. Lesker is used to determine the flux of neutral or ionized particles towards the sample during a deposition process. Using this data, the deposition rate can be monitored even during deposition. The depth resolution is ± 0.037 Å. It can operate with and without a grid.

    Person of interest: Mgr. Peter Klein, Ph.D. pklein(at)mail.muni.cz

  • RFEA

    Semion RFEA (Retarding Field Energy Analyser) from Irish manufacturer Impedans Plasma Measurement is a device for the measurement of the ion flux and energy distribution function of ions arriving to the surface of a growing thin film in real-time using a sample simulation with an integrated sensor. This diagnostic system gives accurate information relevant to the in-situ properties of deposited thin films. The system is compatible with the following power supplies: dc, p-dc, RF, p-RF, microwave, and HiPIMS. The time resolution is 1 µs, and the energy resolution is 1 eV. The maximum operating temperature is 150°C.

    Person of interest: Mgr. Peter Klein, Ph.D.  pklein(at)mail.muni.cz

  • Vector network analyzer

    R&S®ZVL vector network analyzer from Rohde&Schwarz is a device that combines the functions of a network analyzer, spectrum analyzer, and power meter in one instrument. It measures the S-parameter (scattering matrix) of a double gate. The device operates in the 9 kHz - 15 GHz range. It is an indispensable tool for analyzing high-frequency and high-speed circuits, cables, and couplers. It is used for the measurements of frequency dependencies of voltage and current probes (e.g., for DBD discharge measurements even in time scales of hundreds of ps).

    Person of interest: prof. Mgr. Vít Kudrle, Ph.D. kudrle(at)sci.muni.cz

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Preparation of thin films and nanomaterials

  • Magnetron deposition chambers

    Vinci Technologies PVD 50S

    This device is a custom-built vacuum deposition system from Vinci Technologies for thin film preparation. Up to 5 targets can be placed in the chamber simultaneously to serve as a source of sputtering material. The targets can be metal, composite or ceramic and are 3 inches in diameter. It uses DC, pulsed, HiPIMS and RF voltage sources to ignite the plasma. The device is equipped with a transition chamber, called a load-lock, which allows samples to be inserted into the chamber without disturbing the vacuum. The 6-inch diameter substrate holder can be rotated, biased, and heated to 750°C. The device is equipped with a MOS system that allows real-time in-situ monitoring of stress in the growing layer.

    Applications:

    • oxides, nitrides, hydrides or carbides with various stoichiometry
    • research of mettalic glasses
    • hard protective coatings
    • nanocomposites thin films
    • antibacterial coatings

    Person of interest: doc. Mgr. Pavel Souček, Ph.D. soucek(at)mail.muni.cz

  • HVM Flexilab

    Two versatile laboratory vacuum deposition systems from HVM Plasma are used to prepare layers from up to three targets simultaneously. The targets can be metal, composite or ceramic and are 2 inches in diameter. It uses DC, pulsed, HiPIMS and RF voltage sources to ignite the plasma. The substrate holder can be rotated, biased, and heated to 700°C. Its compact size makes it extremely suitable for experimental research and offers a wide range of selectable deposition parameters.

    Applications:

    • oxides, carbides, nitrides of various stoichiometry
    • research of High Entropy Alloys
    • dielectric layers
    • hard protective coatings

    Person of interest: doc. Mgr. Pavel Souček, Ph.D. soucek(at)mail.muni.cz

  • Alcatel SCM 650

    The Alcatel SCM 650 semi-industrial vacuum deposition device is used for deposition process diagnostics and thin film preparation. The system can be equipped with three types of planar magnetron heads (circular with a diameter of 7.5 cm and 20 cm and rectangular with dimensions of 7.6 cm x 25 cm). The targets can be metal, composite or ceramic. It uses DC, pulsed, HiPIMS and RF voltage sources to ignite the plasma. The substrate holder can be rotated, biased, and heated. The system is mainly used for plasma diagnostics.

    Applications:

    • measurement of plasma parameters (OES, probes, QCM, fast ICCD camera, RFEA)
    • diagnostics of deposition parameters
    • monitoring of plasma instabilities
    • hard protective coatings

    Person of interest: doc. Mgr. Pavel Souček, Ph.D. soucek(at)mail.muni.cz

  • Naprašovačka Quorum

    Q150RES from Quorum Technologies is small coating device for deposition of thin metallic layer over non-conductive samples before SEM (scanning electron microscopy) analysis. It can utilize electirc arc (e.g. C) or magnetron sputtering (Pt, Au, Ir). Its small size suits quick and easy sample preparation.

    Person of interest: Mgr. Jana Jurmanová, PhD. janar(at)physics.muni.cz

  • Capacitively coupled deposition chambers

    PECVD reactor R1

    A reactor called R1 is a device developed at the Department of Plasma Physics and Technology. The reactor chamber is made of glass, which allows optical monitoring of the discharge. Its transparency makes the reactor suitable for the presentation of capacitively coupled discharges. The chamber is used for plasma chemical deposition from the gas phase (PECVD). The discharge is ignited by an RF generator at 13.56 MHz. The operating pressure is typically 15-20 Pa. The device is suitable for deposition at low temperatures.

    Applications:

    • research and development of flexible polymer substrates
    • deposition of organosilicon layers, e.g. SiOxCyHz(N)
    • depozition of DLC doped with various elements (Si, O2, Ag)

    Person of interest: doc. RNDr. Vilma Buršíková, Ph.D. vilmab(at)physics.muni.cz

  • Deposition reactor GEC

    The GEC reactor is an all-metal ultra-high vacuum (UHV) reactor. It is used for the deposition of thin films from the gas phase (CVD and PECVD). The discharge is ignited by an RF generator up to 300 W. The device allows independently controllable bias (bias up to -600V).

    Applications:

    • development of thin films of various composition
    • deposition of thin DLC films doped with Cu for bioapplications

    Person of interest: doc. RNDr. Vilma Buršíková, Ph.D. vilmab(at)physics.muni.cz

  • PECVD reactor R4

    The R4 reactor is a device developed at the Department of Plasma Physics and Technology in 2022 through the MATCA subproject with Vacuum servis company. It is a high-capacity deposition device suitable for industrial applications, enabling the coating of large samples. The equipment is built from the original R2 reactor. It is suitable for plasma-enhanced chemical deposition of thin films from the gas phase (PECVD). The limiting pressure of the apparatus is 10-4 Pa. The plasma can be ignited by DC or RF (13,56 MHz or 27,12 MHz). The power delivered to the plasma is up to 600 W. Depositions can be performed at low temperatures.

    Application:

    • deposition of diamond like layers
    • coating of thermally sensitive materials (protective coatings for plastic parts)
    • coating of metallic meshes for water filters (anticorrosive properties)

    Person of interest: doc. RNDr. Vilma Buršíková, Ph.D. vilmab(at)physics.muni.cz

  • Microwave deposition chambers

    Microwave torch at atmospheric pressure

    A plasma microwave torch is a microwave discharge in the form of a filament or flame at atmospheric pressure with a single or dual-channel nozzle excited in argon. The discharge can be operated in a closed reactor or open environment depending on the precursor used - hydrocarbons, alcohols, and organometallic precursors with reactive hydrogen, oxygen, or nitrogen. The device can be used for the deposition of nanomaterials or thin films on a discharge-heated substrate (200-1000 °C) or in the form of powder collected from the walls of the apparatus or filters.

    Applications:

    • synthesis of inorganic nanoparticles
    • synthesis of carbon nanomaterials – nanoparticles, nanotubes and graphene, diamond-like materials
    • plasma conversion fo organic materials
    • study of filaments self-organization and plasma chemical proceses in microwave plasmas
    • study of plasma interaction with surfaces and nanomaterials

    Person of interest: Mgr. Ondřej Jašek, Ph.D. jasek(at)monoceros.physics.muni.cz

  • Surfatron and Surfaguide

    Surfaguide and Surfatron are microwave discharges with a surface wave. They operate in argon at low and atmospheric pressure with the possible addition of gaseous reactants for nanomaterial synthesis and surface modification. Each device has a different type of geometry, extending the possibility of using the discharge for various applications.

    Applications:

    • synthesis of nanomaterials on substrates (carbon nanotubes, graphene)
    • deposition of thin films by CVD
    • diagnostics of microwave plasmas

    Person of interest: Mgr. Ondřej Jašek, Ph.D. jasek(at)monoceros.physics.muni.cz

  • Other deposition devices

    Laboratory reactor for thin film preparation

    The laboratory PVD reactor for the preparation of thin films was developed at the Department of Plasma Physics and Technology. It allows coating various substrates, both electrical and dielectric. The reactor chamber has a holder for two evaporated elements and is equipped with an electron gun. An oscillating crystal is mounted in the reactor to allow in-situ measurement of the growing layer thickness.

    Applications:

    • conductive contacts
    • protective layers
    • optical films, semitransparent mirrors

    Person of interest: doc. Mgr. Pavel Slavíček, Ph.D. ps94(at)physics.muni.cz

  • Annealing furnace

    The high-temperature furnace is used for the annealing of samples and chemical vapor deposition. The high-temperature cylindrical furnace can operate from 30°C to 1 050°C with defined heating rates and possible rapid heating and cooling of samples. The sample compartment consists of a quartz tube with an inner diameter of 45 mm. It can be operated at low to atmospheric pressure in the desired gas mixture for various sample annealing or (PE)CVD deposition processes on substrates

    Applications:

    • annealing, reduction or oxidation of substrates, nanomaterials or powders in control atmosphere

    Person of interest: Mgr. Ondřej Jašek, Ph.D. jasek(at)monoceros.physics.muni.cz

  • NanoSpider

    NanoSpider NS LAB 500 from ELMARCO is a device for the preparation of nanofibres by needle-free electrospinning. This equipment is part of a roll-to-roll experimental line. The electrospun electrode can have a width of up to 350 mm, and the unwinding speed is up to 5 000 mm/min. Nanofibers can be deposited on different types of unwound substrates, e.g. polymer, in large quantities. The device is used in the research of preparation and production of nanofibres used in filtration membranes suitable for liquids and air.

    Person of interest: RNDr. Zlata Kelar Tučeková, PhD. zlata.tucekova(at)mail.muni.cz

  • Electrospinning

    Zařízení pro technologii elektrostatického zvlákňování používá vysokonapěťový zdroj Spellman SL150 a stříkačkovou pumpu NE-1000 firmy New Era Pump System, Inc.The device for the electrospinning technology uses a Spellman SL150 high-voltage power supply and a NE-1000 syringe pump from New Era Pump System, Inc. The syringe pump maintains a constant discharge of electrospun material from 0.73 µL/hr to 2,100 mL/hr, depending on the syringe type. The device is fully automatic and programmable. This technology is used to produce nanofibers for research and development of, for example, nanofiber filters.

    Person of interest: RNDr. Zlata Kelar Tučeková, PhD. zlata.tucekova(at)mail.muni.cz

  • Vacuum spray chamber

    A vacuum spray chamber is a device that allows the spraying of layers under reduced pressure in a chamber with a horizontally controllable linearly shaped pneumatic spray nozzle. A PC fully controls the spraying process and nozzle movement. The heated substrate pad allows heating up to 100°C. The device enables the spraying of layers from stock solutions of aqueous suspensions containing solvents. This chamber was developed within the framework of the PoC sub-project TP01010039 and is used for the production of thin GO papers of A4 size.

    Person of interest: RNDr. Richard Krumpolec, PhD. krumpolec(at)mail.muni.cz

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Sample analyses
Chemical analyses

  • XPS – X-ray photoelectron spectroscopy

    ESCALAB 250Xi from Thermo Fisher Scientific is an extremely powerful XPS spectrometer combining high sensitivity with high-resolution quantitative imaging. This system is a multi-technological device designed to analyze the chemical composition and surface condition of solids. It allows qualitative and quantitative detection of all elements (except H and He). It provides information on the spatial and depth distribution of elements. It analyses the chemical state of the sample, including binding and oxidation states. It determines sorption capacity and reactions (adsorption, ion exchange, etc.). The energy resolution of the instrument is FWHM ≤ 0.45 eV Ag 3d5/2 peak, and the spatial resolution is below 20 µm. ESCALAB can handle 2D imaging and mapping as well as depth profiling. The instrument is also capable of operating in UV mode (Ultraviolet Photoelectron Spectroscopy), as REELS (Reflection Electron Energy Loss Spectroscopy), and as ISS (Ion Scattering Spectroscopy).

    Applications:

    • polymers, glass, ceramics
    • semiconductors, dielectrics and magnetic materials
    • research of nanomaterials, biotechnology and a plethora of industries

    Person of interest: RNDr. Monika Stupavská, PhD.​ stupavska(at)mail.muni.cz

  • SIMS – Secondary ion mass spectrometry

    SurfaceSeer –I from KORE Technology is a highly sensitive surface-analysis spectrometer. The SIMS technology uses ions bombarding the surface of the sample. The mass spectrometer detects the samples's sputtered secondary ions. It can determine the elemental, isotopic, or molecular composition of the surface. The composition obtained corresponds to 1 to 2 nm of the top layer of the sample material. The SurfaceSeer -I can operate in static mode with minimal destruction of the sample surface. It is suitable for mass spectra and 2D spectral imaging. The second mode, the so-called deep mode, is used for elemental composition determination in deeper layers and, in many cases, for molecular analysis. The device is highly sensitive (detection of 109 atoms/cm2) and can work with both positive and negative SIMS (word tracking). The mass resolution is >3000 M/ΔM with a range of >1000 m/z.

    Applications:

    • polymers, glass, ceramics
    • semiconductors, magnetic materials and dielectrics
    • biotechnology and industry

    Person of interest: RNDr. Monika Stupavská, PhD.​ stupavska(at)mail.muni.cz

  • MALDI – Matrix-assisted laser desorption/ionization

    The AXIMA Resonance from Shimadzu s a versatile MALDI mass spectrometer with a time-of-flight (TOF) detector. An N2 laser (337 nm) with a variable repetition rate is used for sample desorption. A quadrupole ion trap allows the selection of parent ions with high resolution and high sensitivity. TOF in the reflection mode increases the sensitivity and accuracy for all measured ions. The device can detect both positive and negative ions in the mass range of 100 to 20,000 Daltons. The maximum sample thickness is 0.5 mm.

    Applications:

    • analysis of small molecules – organic and inorganic
    • structural characterization and identification of synthetic polymers
    • structural characterization and sequencing of biomolecules (peptides, proteins, etc.)
    • purity analyses of materials (medical drugs, glass, metals, polymers)

    Person of interest: RNDr. Monika Stupavská, PhD.​ stupavska(at)mail.muni.cz

  • Raman spektroscopy

    The LabRAM HR Evolution Raman spectrometer from Horiba Scientific is used for the structural analysis of samples. It measures the vibrational, rotational, and total low-energy modes of molecules. The spectrometer with a focal length of 800 mm is equipped with three excitation lasers: UV - 325 nm, VIS - 532 nm, and NIR - 785 nm. The spectrometer has 10x, 50x, 100x objectives and a 74x achromatic UV objective. The spectral range is from 10 to 2 200 cm-1. The instrument allows 2D and 3D pattern mapping. Due to the high resolution and low noise, accurate information on crystallinity, polymorphism and overall state of surface molecules can be obtained.

    Applications:

    • study of the thin films
    • DLC graphitization

    Person of interest: doc. Mgr. Pavel Souček, Ph.D. soucek(at)mail.muni.cz

  • EDX – Energy-dispersive X-ray spectroscopy

    The X-MAX50 is an extension of our SEM Mira3 scanning electron microscope. The EDX (Energy-dispersive X-ray spectroscopy) allows the chemical composition of the individual elements in the sample to be determined.

    Person of interest: Mgr. Jana Jurmanová, Ph.D. janar(at)physics.muni.cz

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Surface diagnostics

  • SEM – Scanning electrone microscope

    The MIRA3 scanning electron microscope from TESCAN GROUP, a.s. is a PC-controlled microscope equipped with a Schottky field emission electron gun designed for high vacuum or variable pressure. It has a SE (secondary electron) and a BSE (backscattered electron) detector. Both detectors are also housed in the lens objective (TTL detectors), allowing for very short working distances with high resolution. The Beam Deceleration Mode (BDM) allows for a higher contrast display of fine details on the sample surface. The maximum resolution is 1 nm at 30kV, and the magnification range is from 2x to 1,000,000x.

    Several expansion elements are mounted on the device. The EDX (Energy Dispersive X-ray Spectroscopy) detector allows the analysis of the elemental composition of the material surface. The WDS (Wavelength Dispersive Spectroscopy) detector can refine the previous analysis and detect even significantly lower elemental concentrations. The EBIC (Electron Beam Induced Current) detector records the charge distribution on the surface of semiconductors and dielectrics. The STEM (Scanning Transmission Electron Microscopy) detector allows the viewing of suitable samples (nanoparticles, thin films down to tens of nanometers) for bright field (BF) and dark field (DF) transmission.

    Applications:

    • material's surface composition and mapping
    • analysis of composition and mapping for art restoration
    • search for surface defects - dirt, foreign coatings
    • searching for defects in cracks or fractures - errors in the sample structure (micro cavities, poor quality fillers, chemically foreign particles...)
    • imaging of sensitive samples - polymers, biological preparations, thin films, nanoparticles, ...
    • monitoring of structural and chemical changes after plasma treatment
    • analyses to determine the causes of faults on various equipment

    Person of interest: Mgr. Jana Jurmanová, Ph.D. janar(at)physics.muni.cz

  • AFM – Atomic force microscopy

    Ntegra Prima from NT-MDT is a modular atomic force microscope that allows the use of different scanners for a wide range of applications. The system has low thermal drift and excellent thermal stability, which plays a vital role in applications where high precision of long-term positioning is required due to long-term experiments, as well as in nanomanipulation, electro-corrosion experiments, nanolithography, etc. The instrument can scan in the following modes: contact, non-contact, lateral force, phase imaging, and force curves. The scanning range is 100x100x12 mm with a sensitivity better than 2 μm.

    Applications:

    • three-dimensional surface imaging
    • surface relief analysis
    • roughness measurement

    Person of interest: doc. RNDr. Vilma Buršíková, Ph.D. vilmab(at)physics.muni.cz

  • Confocal microscope

    The Olympus OLS 4000 LEXT is a laser confocal microscope that can capture high-resolution 3D images. It works by sequentially imaging a sample between two heights and then recombining it to produce images and a 3D projection of the surface that can be quantified. Its specially developed lenses produce high-quality images of the sample. Different imaging methods can be used: BF/DIC/Laser/Laser Confocal DIC. The source is a 405 nm semiconductor laser. The magnification range is from 108x to 17 280x. Lenses available are 5x, 10x, 20x, 50x, 100x. Optical magnification is 1x to 8x with an imaging field size of 2560x2560 - 16x16 µm.

    Applications:

    • measurement of the roughness of profiles
    • measurement of dimensions of surface reliefs, patterns, defects, etc.
    • area measurement of surface formations

    Person of interest: doc. RNDr. Vilma Buršíková, Ph.D. vilmab(at)physics.muni.cz

  • Profilometer

    DektakXT is a 3D profilometer from Bruker. This stylus profilometer is for advanced analysis and measurement of surfaces at the nanometer level. The measurement is contact-based and allows both 2D and 3D surface analysis. The stylus sensor is a LIS3 (Low Inertia Sensor) with a strength from 1 to 15 mg. The device has multiple stylus types. The maximum sample thickness is 50 mm, and the maximum sample size is 20 cm.

    Applications:

    • measurement of sample roughness.
    • measurment of the thickness of layers on a step
    • measurement of thin film stress from substrate curvature

    Person of interest: doc. RNDr. Vilma Buršíková, Ph.D. vilmab(at)physics.muni.cz

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Mechanical properties

  • Nanoindentor

    Triboindenter Hysitron Ti 980 from Bruker is an advanced nanoindenter for high-precision analysis of the mechanical and tribological properties of material surfaces. The instrument can operate in quasi-static indentation, scratch-testing, nanowear, and SPM imaging modes. The nanoindenter has Berkovich-type tips. The tip load ranges from ≤30 nN to 10 N (dual-head system) with a depth resolution of <0.02 nm (noise level <0.2 nm). The maximum indent depth is >5 µm.

    Aplikace:

    • research on hard protective coatings
    • study of DLC and diamond-like coatings
    • research on nanohardness of materials

    Person of interest: doc. RNDr. Vilma Buršíková, Ph.D. vilmab(at)physics.muni.cz

  • Scratch tester

    The REVETEST Xpress plus scratch tester from Swiss company CSM Instruments, now American company Anton Paar, is used for comprehensive analysis and characterization of the mechanical properties of thin film-substrate systems. In combination with other instruments, it is used to test adhesion and fracture toughness. The device can operate in several modes: constant, progressive, and incremental loading. The load size ranges from 0.5 N to 200 N, with a maximum specimen size of 300 mm.

    Applications:

    • adhesion quantification
    • evaluation of friction and deformation
    • cyclic and matrix tests for comprehensive wear studies

    Person of interest: doc. RNDr. Vilma Buršíková, Ph.D. vilmab(at)physics.muni.cz

  • Tear tester

    The AGS-5knX tear tester from Shimadzu allows an uniaxial tensile testing of the mechanical properties of materials. By defined stressing of materials with automatic sensoring system, their tention and adhesion can be studied. This programmable device enables both tensile and tear tests. The force range is up to a maximum of 10 kN. The instrument is equipped with two dynamometers of 100 N and 5 kN. Loading is done directly by a high-precision constant speed control method via a backlash-free ball screw drive. The sliding speed is adjustable from 0.001 to 1000 mm/min.

  • Trhačka SM

    Multifunctional surface properties measurement device TA.XTplusC Texture Analyser TA50/900E from Stable Microsystems is used for the measurement of adhesion forces and mechanical characteristics of various materials. Strain gauges with capacities up to 50 kg and 500 g are available for high-resolution measurements. In addition to the standard clamps for testing the mechanical properties of materials, the device is equipped with the following modules:

    • a module for measuring adhesion forces at 90° angles
    • a module for measuring adhesion forces at 180° angles
    • a module for measuring the coefficient of friction according to ASTM 1894-90
    • metal clamping base with three-point bending measurement kit
    • set of spherical and planar probes for mechanical testing of materials
    • relay control unit for communication with external measuring devices
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Optical analyses

  • Ellipsometry

    The Department of Plasma Physics and Technology has three ellipsometers covering a wide spectral range. Ellipsometry is an optical method of analyzing the dielectric properties (complex refractive index or dielectric function) of thin films. It measures the change in polarisation of light after interaction with a sample and compares it with a model. It can be used to characterize structure, roughness, thickness, homogeneity, uniformity, crystalline nature, electrical conductivity, and other material properties and defects.

    • Horiba Jobin Yvon UVISEL
      • spectral range: 0.6 eV - 6.5 eV,  incidence angles 55° - 90°
    • Woollam IR-VASE
      • spectral range: 300 cm-1 - 6 500 cm-1, incidence angles 25° - 90°
    • Horiba Jobin Yvon UVISEL2 VUV
      • spectral range: 0.6 eV - 8.5 eV, fixed angle of incidence 70°
      • measurement in vacuum and the possibility of sample heating

    Aplikace:

    • reflection and transmission mode measurements (UVISEL and IR-VASE)
    • determination of optical properties of thin films, characterization of defects (roughness, inhomogeneity, non-uniformity)
    • suitable for thin film samples and liquids

    Person of interest: Mgr. Daniel Franta, Ph.D. franta(at)physics.muni.cz

  • Spectrophotometry

    The Department of Plasma Physics and Technology has two spectrophotometers. Spectrophotometry is an optical method that measures the change in light intensity after interaction with a sample (reflection, transmission).

    • Perkin Elmer Lambda 1050
      • spectral range 0.38 eV - 6.6 eV
      • possibility to measure in transmission and reflection mode
      • dual-beam monochromator for high spectral resolution
    • Bruker Vertex 80v
      • holder for perpendicular transmittance measurements
      • FTIR
      • reflective extension for 7° angle of incidence
      • measurement in vacuum
      • vibration mode measurement

    Applications:

    • measurement of optical properties (transmittance, reflectance, attenuated total reflection – ATR)
    • determination of optical properties of thin films, characterization of defects (roughness, inhomogeneity, non-uniformity)
    • suitable for thin film samples, liquids, powders and pellets

    Person of interest: Mgr. Daniel Franta, Ph.D. franta(at)physics.muni.cz

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Others

  • XRD – X-ray diffractometer

    The SmartLab typ F X-ray diffractometer from Japanese manufacturer Rigaku is one of the most powerful and versatile mass-produced instruments. The device is equipped with a closed X-ray source with a copper anode and a vertical theta-theta goniometer with a horizontal sample location with independent movement of the source and detector. The smallest step of the goniometer is 0.0001°, which allows high-resolution measurements. The movement of the goniometer is limited to a wide arc from -3° to 160° (2 theta). The sample can be tilted from -5° to 95°. In-plane measurements with a horizontally attached sample can be made by moving the detector in a plane from -3° to 120°. A 1D detector in Bragg-Bretan configuration and a 0D detector in parallel beam configuration can be used for measurements. This versatile configuration allows both out-of-plane and in-plane diffraction measurements. Adapters for SAXS (small angle scattering mode) and reflectance measurements are also available. Individual diffraction patterns can be obtained, as well as sample mapping. It is possible to perform qualitative and quantitative phase analysis, layer stress analysis, and texture measurements on samples up to 6" in size. Samples in the form of thin films, multilayers, as well as powders, nanoparticles, and bulk materials can be analyzed.

    Applications:

    • structural and phase analysis of crystalline samples
    • analysis of powders, nanoparticles and thin films
    • research and development of thin films
    • research on X-ray analysis of solids

    Person of interest: doc. Mgr. Pavel Souček, Ph.D. soucek(at)physics.muni.cz

  • SEE system

    SEE system is a device developed by the Masaryk University spin-off company Advex Instruments. Its advantage is measurement simplicity, portability, and overall compactness. It can be used to measure the contact angle of a liquid with a sample and to evaluate the free surface energy of a material.

    Applications:

    • surface energy research of various materials
    • study of the effect of plasma treatments on various materials

    Person of interest: Mgr. Jakub Kelar, Ph.D. jakub.kelar(at)mail.muni.cz 

  • Theta Lite

    Theta Lite from Biolin Scientific enables contact angle measurement and subsequent free surface energy evaluation. It is suitable for static and dynamic contact angle measurements and stress measurements of surfaces and liquid boundaries. The device is equipped with an integrated substrate holder and allows automatic droplet delivery. The instrument adds background illumination for better resolution of droplet images. The measuring range is from 0° to 180° and 0.01 mN/m to 2000 mN/m. Measurement accuracy is +- 0.1° and +- 0.01 mN/m.

    Aplikace:

    • surface energy research of various materials
    • study of the effect of plasma treatments on various materials

    Person of interest: Mgr. Jakub Kelar, Ph.D. jakub.kelar(at)mail.muni.cz

  • Dynamic contact angle

    The DSA 30 from the German company Krüss s is a PC-controlled system for fast measurement of static and dynamic contact angles. By measuring the contact angle, important surface parameters, such as the free surface energy, can be determined. The device can use 6 different drop analysis methods. It is equipped with automatic baseline detection and automatic drop delivery. The CCD camera has parameters of 61 fps (780 × 580 px) or 311 fps (780 × 60 px). The contact angle range is from 1° to 180° with a limiting resolution of 0.1°. The measured surface energy range is 0.01 mM/m to 1000 mN/m with a resolution of 0.01 mN/m (in alternative units of mJ/m2).

    Applications:

    • suitable for a wide range of materials (silicon, glass, polymers, thin films, fibers, etc.)
    • study of surfaces and interfacial tension between liquids

    Person of interest: doc. RNDr. Vilma Buršíková, Ph.D. vilmab(at)physics.muni.cz

  • 4-point probe

    4-point probe is used for the meaurement of electric resistence and conductivity of layers or bulk materials

    Person of interest: doc. RNDr. Tomáš Homola, PhD. tomas.homola(at)mail.muni.cz

  • Climate chamber

    The Memmert ICH110eco climate chamber is used for long-term sample storage in a controlled atmosphere. The chamber allows samples to be stored in an environment with adjustable temperature and humidity. The temperature setting range is from -10° to +60°C with an accuracy of 0.1°C. Humidity can be adjusted from 10 to 80% with a resolution of 0.5% using a steam generator from an external distilled water source. The volume of the chamber is 108 L. The chamber is also equipped with a UV illuminator and daylighting that can simulate the aging of samples outdoors.

    Applications:

    • investigation of aging of plasma surface treatment
    • controlled storage of experimental samples

    Person of interest: RNDr. Zlata Kelar Tučeková, PhD. zlata.tucekova(at)mail.muni.cz

  • Annealing furnace

    The high-temperature furnace is used for the annealing of samples and chemical vapor deposition. The high-temperature cylindrical furnace can operate from 30°C to 1 050°C with defined heating rates and possible rapid heating and cooling of samples. The sample compartment consists of a quartz tube with an inner diameter of 45 mm. It can be operated at low to atmospheric pressure in the desired gas mixture for various sample annealing or (PE)CVD deposition processes on substrates

    Applications:

    • annealing, reduction or oxidation of substrates, nanomaterials or powders in control atmosphere

    Person of interest: Mgr. Ondřej Jašek, Ph.D. jasek(at)monoceros.physics.muni.cz

  • Laboratorní analytické váhy

    The Department of Plasma Physics and Technology is equipped with standard analytical balances with anti-vibration tables. The accuracy of measurement is 0.0001g.

    Applications:

    • research on surface plasma treatment (Washburn method for measuring the absorption and diffusion of liquid into the sample).
    • determination of thin film density

    Person of interest: doc. Mgr. Pavel Souček, Ph.D.  soucek(at)physics.muni.cz

  • Seepage meter

    The seepage meter is a laboratory device manufactured at the Department of Plasma Physics and Technology that meets the ISO standard for measuring seeping/soaking of porous materials, e.g., textiles.

    Person of interest: Mgr. Vlasta Štěpánová, Ph.D. vstepanova​(at)mail.muni.cz

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Good practices

CEPLANT cooperate with companies, corporations, and research organizations through contract research and international projects. Together with industrial partners, we develop plasma technologies tailored to their specific needs and implement them directly into production processes – including the design of complete production lines. Roll-to-roll systems are no exception; for example, we apply atmospheric plasma generated by curved sources in continuous treatment setups. Explore our collaborations with research institutions (marked in blue) and industry partners (marked in red) over the years on the interactive map.

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Coating Plasma Innovation (France) a Crown Van Gelder (Netherlands)

International project EUROSTARS

Developing a commercially viable and environmentally friendly PECVD in-line coating process for specialty papers using atmospheric plasma with the elimination of silicones in production

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ROPLASS (Česko), Polartherm Flachglas (Německo) a INNOVENT e.V. (Německo)

Mezinárodní projekt IraSME – GLAREAL

Ekonomicky i ekologicky výhodnější plazmová technologie pro čištění a povrchovou aktivaci velkoplošného skla s možností implementace do průmyslových linek.

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SAULE Technologies (Poland) a ROPLASS (Czechia)

International industry cooperation

Development of atmospheric plasma technology for economically and environmentally efficient production of large-scale flexible perovskite solar cells and subsequent implementation in an existing roll-to-roll production line

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NAFIGATE Corporation (Czechia)

International project COSME EK/ELIIT

Development of in-line plasma technology and installation of the production line itself for large-scale production of advanced filtration membranes based on electrospun nanofibers to improve the filtration capabilities of air and water filters

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Nanize (Norway)

International contractual research

Activation of the substrate by plasma and subsequent curing of the layers by the plasma for the preparation of surfaces resistant to dirt and soiling with a self-cleaning effect suitable, for example, for anti-graffiti
coatings

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Eaton European Innovation Center, Eaton Elektrotechnika (Czech)

National contractual research

Simulation of streamer discharges in electronegative gases and their interaction with dielectric barriers in different configurations for the development of high-breakdown voltage switches

 

Robust Plasma Systems s.r.o.

Spin-off company ROPLASS s.r.o.


ROPLASS s.r.o. - ROBUST PLASMA SYSTEMS was founded in 2011 to commercialise atmospheric pressure plasma generators invented by the team at Masaryk University. ROPLASS’s key competence is to design, develop and manufacture atmospheric-pressure plasma sources and related equipment for surface modification, above all of polymeric materials used in the automotive, textile, paper and other industries. The business model of ROPLASS is focused on providing an adequate “nanotechnology” response to the technological problems of regional industrial partners.

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